1 河北工业大学 电子信息工程学院, 天津 300401
2 中国科学院半导体研究所 半导体照明研发中心, 北京 100083
利用热氧化法将电化学腐蚀制备的多孔GaN薄膜氧化成三维孔隙状β-Ga2O3薄膜, 分析了多孔GaN薄膜与传统GaN薄膜在氧化机理上的区别, 并通过材料表征证明了多孔GaN薄膜能够实现更快的氧化速率。随后将氧化生成的β-Ga2O3薄膜制备成MSM型β-Ga2O3基日盲紫外探测器, 在260nm光照及10V偏压下, 器件的响应度为16.9A/W, 外量子效率为8×103%, 探测率D*达到了2.03×1014Jones, 能够满足弱光信号的探测需求。此外, 器件的瞬态响应具有非常好的稳定性, 相应的上升时间为0.75s/4.56s, 下降时间为0.37s/3.48s。
热氧化 电化学腐蚀 深紫外探测器 thermal oxidization electrochemical etching β-Ga2O3 β-Ga2O3 solar-blind photodetector GaN GaN
1 河北工业大学电子信息工程学院微纳光电和电磁技术创新研究所, 天津 300401
2 天津市电子材料和器件重点实验室, 天津 300401
国家自然科学基金、河北省自然科学基金、天津市自然科学基金、人社部留学人员科技活动项目择优资助优秀类、河北省计划项目、河北省高校百名优秀创新人才支持计划;
光学器件 AlGaN 深紫外发光二极管 外量子效率 空穴注入效率 光输出功率 激光与光电子学进展
2019, 56(6): 060001
Author Affiliations
Abstract
1 Institute of Micro-Nano Photoelectron and Electromagnetic Technology Innovation, School of Electronics and Information Engineering, Hebei University of Technology, Key Laboratory of Electronic Materials and Devices of Tianjin, Tianjin 300401, China
2 e-mail: zh.zhang@hebut.edu.cn
3 Department of Photonics and Institute of Electro-Optical Engineering, Taiwan Chiao Tung University, Hsinchu 30010, China
4 Department of Electrical Engineering and Computer Sciences and TBSI, University of California at Berkeley, Berkeley, California 94720, USA
It is well known that the p-type AlGaN electron blocking layer (p-EBL) can block hole injection for deep ultraviolet light-emitting diodes (DUV LEDs). The polarization induced electric field in the p-EBL for [0001] oriented DUV LEDs makes the holes less mobile and thus further decreases the hole injection capability. Fortunately, enhanced hole injection is doable by making holes lose less energy, and this is enabled by a specifically designed p-EBL structure that has a graded AlN composition. The proposed p-EBL can screen the polarization induced electric field in the p-EBL. As a result, holes will lose less energy after going through the proposed p-EBL, which correspondingly leads to the enhanced hole injection. Thus, an external quantum efficiency of 7.6% for the 275 nm DUV LED structure is obtained.
Photonics Research
2019, 7(4): 040000B1
